F Marty, L Rousseau, B Saadany, B Mercier, O Francais, et al.. Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures.
Microelectronics Journal, Elsevier, 2005, 36 (7), pp.673--677.
⟨10.1016/j.mejo.2005.04.039⟩.
⟨hal-00692954⟩