On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching

Yamin Leprince; K. Nguyen; Philippe Basset; F. Marty; Y. Leprince-Wang; Tarik Bourouina

doi:10.1063/1.4805024

On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching

Yamin Leprince ¹ K. Nguyen Philippe Basset ² F. Marty ³ Y. Leprince-Wang ⁴ Tarik Bourouina ¹

1 ESYCOM - Electronique, Systèmes de communication et Microsystèmes

2 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

3 IEF - Institut d'électronique fondamentale

4 LPMDI - Laboratoire de Physique des Matériaux Divisés et des Interfaces

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

Liste complète des métadonnées

https://hal-upec-upem.archives-ouvertes.fr/hal-01721058
Contributor : Yamin Leprince <>
Submitted on : Thursday, March 1, 2018 - 4:44:56 PM
Last modification on : Thursday, February 7, 2019 - 3:51:14 PM

On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching

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On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching

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