On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching

Yamin Leprince 1 K. Nguyen Philippe Basset 2 F. Marty 3 Y. Leprince-Wang 4 Tarik Bourouina 1
1 ESYCOM - Electronique, Systèmes de communication et Microsystèmes
2 IEMN - Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
3 IEF - Institut d'électronique fondamentale
4 LPMDI - Laboratoire de Physique des Matériaux Divisés et des Interfaces
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Journal articles
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https://hal-upec-upem.archives-ouvertes.fr/hal-01721058
Contributor : Yamin Leprince <>
Submitted on : Thursday, March 1, 2018 - 4:44:56 PM
Last modification on : Friday, October 25, 2019 - 2:34:08 PM

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UPEC-UPEM | CNRS | CNAM | ESYCOM | UNIV-LILLE | ESIEE-PARIS | UNIV-HESAM | UNIV-VALENCIENNES

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Yamin Leprince, K. Nguyen, Philippe Basset, F. Marty, Y. Leprince-Wang, et al.. On the optical and morphological properties of microstructured Black Silicon obtained by cryogenic-enhanced plasma reactive ion etching. Journal of Applied Physics, American Institute of Physics, 2013, 113 (19), ⟨10.1063/1.4805024⟩. ⟨hal-01721058⟩

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