Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester

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https://hal-upec-upem.archives-ouvertes.fr/hal-01721049
Contributor : Yamin Leprince <>
Submitted on : Thursday, March 1, 2018 - 4:41:53 PM
Last modification on : Tuesday, June 11, 2019 - 2:32:05 PM

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Yamin Leprince, N. Nguyen, D. Abi-Saab, Philippe Basset, Elodie Richalot, et al.. Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester. Microsystem Technologies, Springer Verlag, 2012, 18 (11), pp.1807 - 1814. ⟨10.1007/s00542-012-1486-0⟩. ⟨hal-01721049⟩

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