Effect of black silicon disordered structures distribution on its wideband reduced reflectance

Abstract : We present a simple and accurate model for the reflectance simulation of black silicon (BSi) based on the finite element method (FEM). Normalized-root-mean-square error (NRMSE) with experimental measurements below 0.25% has been obtained for wavelength range between 450 and 950 nm. The model is made of a four basic-shape cell whose dimensions are extracted from an accurate topography of the BSi obtained by FIB-SEM tomography. Additional BSi modelling techniques studied, that takes in account the BSi irregular topography, demonstrates an important influence of the local structure height variation in the BSi surface spectral reflectance.
Liste complète des métadonnées

https://hal.archives-ouvertes.fr/hal-01444437
Contributeur : Elodie Richalot <>
Soumis le : mardi 24 janvier 2017 - 10:16:37
Dernière modification le : mardi 31 janvier 2017 - 01:02:13
Document(s) archivé(s) le : mardi 25 avril 2017 - 14:13:41

Fichier

BSi_sim_long_Hal.pdf
Fichiers produits par l'(les) auteur(s)

Identifiants

Collections

Citation

David Abi-Saab, Shermila Mostarshedi, Philippe Basset, Stéphane Protat, Dan Angelescu, et al.. Effect of black silicon disordered structures distribution on its wideband reduced reflectance. Materials Research Express, IOP Publishing Ltd, 2014, 1, pp.45045 - 45045. 〈http://iopscience.iop.org/article/10.1088/2053-1591/1/4/045045/meta〉. 〈10.1088/2053-1591/1/4/045045〉. 〈hal-01444437〉

Partager

Métriques

Consultations de la notice

25

Téléchargements de fichiers

19